Sparkling grating processing technologyIt is the core technology for preparing high-performance diffraction gratings, which achieves directional concentration of light energy by etching periodic serrated grooves with specific inclinations on the surface of the substrate material. It has the characteristics of high diffraction efficiency, precise wavelength selection, and strong process controllability, and is widely used in optical fields such as spectral analysis, laser technology, astronomical observation, etc. It is a key process to break through the limitations of traditional grating performance. ​

High diffraction efficiency and directional focusing are its core technological advantages. Traditional planar gratings have the problem of light energy being dispersed among various diffraction orders, while the processing technology of blazed gratings concentrates more than 80% of the light energy to specific diffraction orders by precisely controlling the blaze angle of the grooves (usually 1 ° -30 °), greatly improving the utilization efficiency of light. In the spectrometer, the scintillation grating prepared by this process can significantly enhance the signal intensity of the target wavelength, making the spectral detection of trace substances more sensitive; In laser tuning systems, efficient output and precise control of specific wavelength lasers can be achieved by optimizing the flare angle design. ​

Multi process adaptation and high-precision control demonstrate technical strength. According to the different substrate materials (glass, metal, semiconductor) and application requirements, the processing technology of blazed grating can be divided into mechanical engraving method, holographic lithography ion beam etching method, laser direct writing method, etc. The mechanical engraving method uses diamond cutting tools to engrave lines on the substrate, and the groove accuracy can reach nanometer level, which is suitable for preparing large-sized gratings; Holographic lithography ion beam etching method uses interference fringes to form lithography patterns, which are then etched by ion beam orientation to form a sparkling structure, suitable for mass production of high-precision gratings. Both processes can achieve precise control of groove period (0.5 μ m-100 μ m) and flare angle, with an error controlled within 0.1 °. ​

Adaptability to complex environments expands application boundaries. The dazzling grating prepared by this process can be coated with metal films or dielectric films such as aluminum and gold on the surface, enhancing wear resistance and corrosion resistance, and adapting to harsh working environments such as high temperature and high humidity. In the spectrometer of astronomical telescopes, the metal film glitter grating can withstand radiation and temperature fluctuations in the space environment; In industrial online detection equipment, the dielectric film shining grating can resist the erosion of dust and chemical gases, ensuring long-term stable operation. ​