Multiphoton polymerization photoresistMultiphoton Polymerization Photoresist is a special photosensitive material designed specifically for femtosecond laser 3D micro nano processing. Multi photon polymer photoresist is designed specifically for femtosecond laser 3D micro nano processing, and the selection needs to comprehensively consider key performance indicators to ensure accuracy, efficiency, and application adaptability.
Application scenarios:
Biomedical: Manufacturing microfluidic chips and biomimetic scaffolds to avoid the biological toxicity of photoinitiators;
Photonic devices: Processing of three-dimensional photonic crystals and micro lens arrays;
Precision machinery: direct writing of components, supporting complex suspended structures.
Selection criteria for key performance indicators:
Resolution: determines the minimum feature size (usually at the level of 100nm), and high resolution supports the manufacture of finer structures (such as microlenses or photonic crystals); But it is necessary to balance cost and performance, and avoid excessive investment.
Sensitivity: Reflects sensitivity to exposure energy, high sensitivity can reduce laser exposure dose and improve processing efficiency; However, it should be noted that high sensitivity may increase environmental sensitivity.
Contrast: Affects the sharpness of pattern edges, high contrast (close to 90 ° sidewall) reduces line blurring and improves structural accuracy.
Development performance: Ensure the removal of unexposed areas and reduce residue; When choosing, attention should be paid to the development speed and uniformity.
Mechanical properties: including hardness, toughness, and tensile strength, to prevent deformation or cracking during coating or processing.
Chemical resistance and thermal stability: resistant to corrosive agents, cleaning agents, and high-temperature treatments (such as baking) to avoid graphic distortion; Thermal stability is particularly important for high-energy laser environments in multiphoton polymerization.
Purity: The impurity content should be strictly controlled at the ppb level to reduce the risk of micro defects with high purity.