This customer is a professional substrate material supplier for GaN on Sapphire technology, a third-generation semiconductor. The company develops substrate materials that are adapted to different chip application fields and their epitaxial technology characteristics. Through graphic structure design, different material combination applications, and process implementation, the company provides comprehensive substrate material solutions for gallium nitride devices.

At present, the company's main products include 2 to 6-inch patterned sapphire substrates (PSS) and patterned composite material substrates (MMS), which are mainly used in lighting, display, backlight sources Mini/Micro LED、 Deep ultraviolet LED and other fields. The company has established the Guangdong Province Semiconductor Substrate Engineering Technology Research and Development Center, focusing on the integrated research and development of substrate and epitaxial technology for the next generation of GaN advanced optoelectronic devices, and conducting research on sapphire substrates for GaN power devices and other technologies.

The FR Scanner film thickness measuring instrument is a visible light interference measurement device with a wavelength range of 370-1020nm, capable of measuring film thickness in the range of 12nm-100um, with an accuracy of up to 0.1% or 1nm and an accuracy of 0.02nm. It is a film thickness measurement device with high platform displacement accuracy and multi-point mapping measurement function. Based on an 8 "sample, the fastest measurement speed can reach 300 points per minute.