Online wafer dryerBy utilizing supercritical technology, substances in a supercritical state are neither gases nor liquids, but possess the diffusivity of gases and the solubility of liquids. This characteristic enables supercritical fluid to efficiently penetrate into the tiny pores on the wafer surface, carrying away residual moisture or cleaning solution, thereby achieving rapid drying.

　　Online wafer dryerMainly used in the wafer drying process of semiconductor manufacturing. After the wafer is cleaned, there will be a lot of residual water or cleaning solution on the surface, which contains impurities. If these residual liquids are allowed to evaporate and dry on their own, the impurities will re adhere to the surface of the wafer, causing pollution. Therefore, it is necessary to use an online wafer dryer to dry the wafer surface to remove these residual liquids and ensure wafer quality.

Product Features:

High reliability: Adopting a sturdy and durable structural design and stable operating performance, ensuring consistency and reliability in long-term use, and reducing maintenance frequency.

Efficient Automation: A loading and unloading mechanism designed specifically for wafer drying processes, meeting the automation needs of advanced production line equipment and improving production efficiency.

Ultra clean environment adaptation: An ultra clean environment suitable for wafer production, ensuring that no pollution is introduced during the drying process and guaranteeing wafer quality.