Equipment Introduction

Scanning electron microscope+electron beam exposure

The Zeiss Sigma 300 scanning electron microscope is widely used to observe the surface structure of conductive materials at the micrometer and submicron levels. The condensed matter direction is mainly used to inspect and identify the results of fabricated microcircuits, waveguides, and other materials.

The scanning electron microscope is equipped with Raith electron beam exposure software, which can realize the design and exposure of dimensional circuits, with a maximum write field of 1000um and a maximum accuracy of 100nm.

Performance indicators: resolution: 20nm -10kV, acceleration voltage: 100V-30kV, magnification: 50-500K, detector: secondary electron detector SE2, Inlens detector and infrared CCD camera.

Main application: Suitable for observing the surface morphology of conductive and non-conductive materials, obtaining secondary electron images of surface morphology.

Sample requirements: Solid non powder dried sample, with a clean surface, no oil stains, no magnetism, and not easily magnetized. The sample must not contain iron (Fe), cobalt (Co), or nickel (Ni). Height less than 20mm, diameter less than 50mm. For porous or easily hygroscopic samples, please vacuum dry them in advance. The sample should have conductivity. If the sample is non-conductive, it needs to be treated with conductive films such as gold plating and carbon.

Note: The article is reproduced on the announcement platform of the School of Physics and Astronomy, Shanghai Jiao Tong University《Scanning Electron Microscope&Electron Beam Exposure