With the increasing demand for refined processes and cost pressures, water quality monitoring in enterprises is no longer limited to“Parameter compliance”So simple, it is more related to process stability, energy management, equipment lifespan, and overall operational efficiency.

Hash continues to expand the depth and breadth of water quality monitoring, covering more key parameters and process scenarios, in complex working conditions:

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Application of dissolved nitrogen in semiconductor functional water

Background Introduction

In the hall of high technology, semiconductor chips are undoubtedly the shining pearl. However, the birth of this pearl was not achieved overnight, as there are countless intricate and rigorous manufacturing processes hidden behind it. Among these numerous processes, the requirement for water purity has reached an almost stringent level. Therefore, ultrapure water plays a crucial role in the production process of semiconductor chips.

Why control the dissolved nitrogen in functional water?

Ultra pure water is the process water used in the microelectronics industry, and semiconductor factories extensively use it for wet cleaning before and after various processes. In addition to removing gases from ultrapure water, in order to meet the specific requirements of certain semiconductor machines, it is also necessary to add gases to ultrapure water to meet the specific functions of the machines. These aerated ultrapure water are also called functional water.

Functional water changes the properties of a solution by adding substances of specific concentrationsZETAPotential (referring to the potential of the shear plane, also known as electromotive force or electromotive force, is an important indicator for characterizing the stability of colloidal dispersion systems). By utilizing the concept of chemical potential to alter the ion distribution on the surface of the cleaning object, a repulsive effect of the same charge can be obtained, thereby improving the removal efficiency of some nanoscale particles. InCMPIn the chemical mechanical polishing (CMP) system, the global or local flatness of the wafer is achieved through the cycle of chemical reactions and mechanical removal processes. As the requirements for wafers become increasingly high and the process becomes more complex,CMPThe cleaning frequency has increased from tens of times to hundreds or even higher, while introducing some special gases during the polishing process to improve efficiencyCMPReduce the material removal rate and surface quality, and lower the defect rate of the product.

In order to achieve better cleaning results, nitrogen is usually added to ultrapure water, and precise control of nitrogen solubility is also required. hashOrbisphere 511The series of online dissolved nitrogen analyzers have precise and powerful process monitoring capabilities.

How to precisely control dissolved nitrogen?

A domestic electronics factory installs oneOrbisphere511The online dissolved nitrogen analyzer (as shown below) provides data for a certain period of time, which is stable over a long period of time10~16ppm.

According to feedback from on-site personnel,HACHThe on-site performance of dissolved nitrogen is excellent, with low maintenance requirements, requiring only one maintenance per year.

fromOrbisphere511From the perspective of on-site application,511The probe design of the series products ensures accurate, reliable, and short response time of the sensor measurement. The built-in excellent temperature compensation mechanism ensures the wide applicability of the instrument. Users can use this instrument to monitor dissolved nitrogen online, achieve precise control of functional water, provide effective monitoring data for users' water process control, and ensure the stable operation of users' subsequent processes.